OPTICAL COMPONENTS FOR 1 MICROMETER CLASS LASERS
FOR LASER APPLICATIONS IN INDUSTRY, LARGE FACILITIES AND RESEARCH
FOR PULSED AND CW LASERS
CILAS offers components and dielectric coatings, from 300nm to 2.5μm.
For imaging purpose in industry, astronomy or space programs : anti-reflection coatings on windows, concave and convex lenses, dichroics, beamsmplitters, long-pass, low-pass, band-pass filters...
For laser systems belonging to 1μm ; anti-reflection coatings, polarizers, beamsplitters, hugh reflectivity mirrors...
Catalog coatings and specific designs available upon request.
| FEATURES OF 1-1,1 μm COATINGS | |
|---|---|
| COATING TYPE | Dielectric coatings based on oxides |
| COATING PROCESS | Plasma Ion Assisted deposition (dense coating) In-situ optical monitoring 900m² of clean room ISO5 to ISO8 |
| COSMETICS | 5/C 1x0.16 per 25mm pupil according to ISO 10110-7 S/D 40-20 |
| ENVIRONMENTAL COMPATIBILITY | Suitable for severe environments (ATOX, radiations, vacuum, humidity…) Space heritage available upon request Cleanable |
| COATING FREE AREAS | Coating free areas masked upon request |
| TYPE | NOMINAL | CUSTOM OPTIONS |
|---|---|---|
| Thin Film Polarizer (on Fused Silica substrate) |
Tp > 98.5 % ; Ts < 0.1 % Extinction ratio 1000:1 AOI 57.5° LIDT: 10 J/cm², 10 ns, 1064 nm |
AOI 45° Higher extinction ratio Blocking of unwanted other wavelengths |
| Antireflection coating (on Fused silica or BK7 substrates) |
R < 0.1 % AOI 0-15° LIDT: 30 J/cm², 10 ns, 1064 nm |
Higher AOI Dual-band AR: 1064/1550 nm, 1064/800 nm, 1064/532 nm |
| Antireflection coating (on high index substrates) |
R < 0.2 % AOI 0-15° LIDT depends on substrate |
Higher AOI Dual-band AR: 1064/1550 nm, 1064/800 nm, 1064/532 nm |
| Beamsplitter (on Fused Silica substrate) |
Rp/Tp Tolerance: +/-2% AOI 45° Available ratios: 50/50 %; 67/33 % ; 75/25 % ; 80/20 % ; 83/17 % |
Other R/T ratios S-polarization |
| Dichroic (on Fused Silica substrate) |
Long-pass coating 1064/830 nm Ts & Tp (1064 nm) > 98 % Rs & Rp (830 nm) > 99 % AOI 45° |
Short-pass coating 1064/532 nm, 1064/355 nm Other AOI |
| Laser mirror (on Fused silica or BK7 substrates) |
R > 99.5 % (AOI 0-15°) Rp > 99 %, Rs > 99.3 % (AOI 45°) LIDT: 45 J/cm², 10 ns, 1064 nm |
Zerodur®, metallic substrates |