OPTICAL COMPONENTS FOR 1 micrometer CLASS LASERS

FOR LASER APPLICATIONS IN INDUSTRY, LARGE FACILITIES AND RESEARCH

FOR PULSED AND CW LASERS

 

  • Feasibility studies and design service
  • From prototype to mass production
  • For high laser damage threshold
  • From small to large dimensions

 

FEATURES OF 1-1,1 μm COATINGS
COATING TYPE Dielectric coatings based on oxides
COATING PROCESS Plasma Ion Assisted deposition (dense coating)
In-situ optical monitoring
900m² of clean room ISO5 to ISO8
COSMETICS 5/C 1x0.16 per 25mm pupil according to ISO 10110-7
S/D 40-20
ENVIRONMENTAL COMPATIBILITY Suitable for severe environments (ATOX, radiations, vacuum, humidity…)
Space heritage available upon request
Cleanable
COATING FREE AREAS Coating free areas masked upon request

 

TYPE NOMINAL CUSTOM OPTIONS
Thin Film Polarizer
(on Fused Silica substrate)
Tp > 98.5 % ; Ts < 0.1 %
Extinction ratio 1000:1
AOI 57.5°
LIDT: 10 J/cm², 10 ns, 1064 nm
AOI 45°
Higher extinction ratio
Blocking of unwanted other wavelengths
Antireflection coating
(on Fused silica or BK7 substrates)
R < 0.1 %
AOI 0-15°
LIDT: 30 J/cm², 10 ns, 1064 nm
Higher AOI
Dual-band AR: 1064/1550 nm, 1064/800 nm,
1064/532 nm
Antireflection coating
(on high index substrates)
R < 0.2 %
AOI 0-15°
LIDT depends on substrate
Higher AOI
Dual-band AR: 1064/1550 nm,
1064/800 nm, 1064/532 nm
Beamsplitter
(on Fused Silica substrate)
Rp/Tp
Tolerance: +/-2%
AOI 45°
Available ratios: 50/50 %; 67/33 %
; 75/25 % ; 80/20 % ; 83/17 %
Other R/T ratios
S-polarization
Dichroic
(on Fused Silica substrate)
Long-pass coating 1064/830 nm
Ts & Tp (1064 nm) > 98 %
Rs & Rp (830 nm) > 99 %
AOI 45°
Short-pass coating
1064/532 nm, 1064/355 nm
Other AOI
Laser mirror
(on Fused silica or BK7 substrates)
R > 99.5 % (AOI 0-15°)
Rp > 99 %, Rs > 99.3 % (AOI 45°)
LIDT: 45 J/cm², 10 ns, 1064 nm
Zerodur®, metallic substrates